Properties of ITO thin films rapid thermally annealed in different exposures of nitrogen gas
Ollotu, E. R., Nyarige, J. S., Mlyuka, N. R., Samiji, M. E., Diale, M.Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-020-04192-y
Date:
August, 2020
File:
PDF, 1.57 MB
2020