Optimization of process parameter variations for 16nm...

Journal of Physics Conference Series 2020 / 03 Vol. 1502

Optimization of process parameter variations for 16nm DG-FinFET using Response Surface Methodology-Central Composite Design

Roslan, Ameer F, Salehuddin, F, Zain, A S M, Kaharudin, K E, Ahmad, I, Hazura, H, Hanim, A R, Idris, S K, Hamid, Afifah Maheran A
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Volume:
1502
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/1502/1/012042
Date:
March, 2020
File:
PDF, 765 KB
2020
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