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Facile ResistâFree Nanopatterning of Monolayers of MoS 2 by Focused IonâBeam Milling
Mupparapu, Rajeshkumar, Steinert, Michael, George, Antony, Tang, Zian, Turchanin, Andrey, Pertsch, Thomas, Staude, IsabelleJournal:
Advanced Materials Interfaces
DOI:
10.1002/admi.202000858
Date:
August, 2020
File:
PDF, 1.48 MB
2020