Growth of a Thick AlN Epilayer by Using the Mixed-Source...

Journal of the Korean Physical Society 2020 / 08 Vol. 77; Iss. 4

Growth of a Thick AlN Epilayer by Using the Mixed-Source Hydride Vapor Phase Epitaxy Method

Kim, Kyoung Hwa, Park, Jung Hyun, Ahn, Hyung Soo, Yang, Min, Yi, Sam Nyung, Jeon, Injun, Cho, Chae Ryong, Kim, Suck-Whan
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Volume:
77
Journal:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.77.282
Date:
August, 2020
File:
PDF, 377 KB
2020
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