Atomically control of surface morphology in Ga2O3...

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Journal of Alloys and Compounds 2020 / 9

Atomically control of surface morphology in Ga2O3 epi-layers with high doping activation ratio

Wang, Dangpo, Li, Jianing, Jiao, Anning, Zhang, Xinchuang, Lu, Xiaoli, Ma, Xiaohua, Hao, Yue
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Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2020.157296
Date:
September, 2020
File:
PDF, 8.27 MB
2020
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