Laser ablative behavior of C/C modified by Si reactive...

Carbon 2020 / 10 Vol. 168

Laser ablative behavior of C/C modified by Si reactive infiltration

Geng, Li, Liu, Xiaochong, Fu, Qiangang, Cheng, Su, Li, Hejun
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Volume:
168
Journal:
Carbon
DOI:
10.1016/j.carbon.2020.06.079
Date:
October, 2020
File:
PDF, 3.56 MB
2020
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