Boosting nitrogen-doping and controlling interlayer spacing...

Nano Energy 2020 / 12 Vol. 78

Boosting nitrogen-doping and controlling interlayer spacing in pre-reduced graphene oxides

Ludwig, Tim, Je, Minyeong, Choi, Heechae, Fischer, Thomas, Roitsch, Stefan, Müller, Ralf, Mane, Rajaram S., Kim, Kwang Ho, Mathur, Sanjay
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Volume:
78
Journal:
Nano Energy
DOI:
10.1016/j.nanoen.2020.105286
Date:
December, 2020
File:
PDF, 10.66 MB
2020
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