Cp2TiCH2Si(Me2)NSiMe3: A Single-Source Precursor to Titanium-based Ceramic Thin Films by Chemical Vapor Deposition
Benoit Chansou, Robert Choukroun, Lydie ValadeVolume:
11
Year:
1997
Language:
english
Pages:
9
DOI:
10.1002/(sici)1099-0739(199703)11:33.0.co;2-q
File:
PDF, 223 KB
english, 1997