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Low-Temperature Fabrication (⤠150 °C) of High-Quality Sputtered Silicon Oxide Thin Film with Hydrogen Plasma Treatment
Seo, Taewon, Park, Hyuk, Jeon, Gilsu, Yun, Juyoung, Park, Seongmin, Seong, Suwon, Chung, YoonyoungJournal:
ACS Applied Electronic Materials
DOI:
10.1021/acsaelm.0c00631
Date:
September, 2020
File:
PDF, 2.87 MB
2020