Integration of Dielectric and Ferroelectric Hafnium Aluminum Oxides for ThinâFilm Transistor Applications
Hsu, Hsiao-Hsuan, Lee, Sheng, Liu, Hsiu-MingVolume:
14
Journal:
physica status solidi (RRL) â Rapid Research Letters
DOI:
10.1002/pssr.202070041
Date:
October, 2020
File:
PDF, 8.31 MB
2020