Confined aluminum fluoride layers derived from the in situ...

Applied Surface Science 2021 / 02 Vol. 538

Confined aluminum fluoride layers derived from the in situ etching of Ti3AlC2 as the robust catalyst for dehydrofluorination reaction

Han, Wenfeng, Yang, Hong, Wang, Linzhe, Liu, Bing, Wei, Xiaoli, Chen, Aimin, Song, Weiyu, Tang, Haodong, Li, Ying
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Volume:
538
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.148022
Date:
February, 2021
File:
PDF, 3.90 MB
2021
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