Ta2O5-y-based ReRAM device with annealing-free Ag:ZrNx-based bilayer selector device
Kim, Donghyun, Park, Ju Hyun, Jeon, Dong Su, Dongale, Tukaram D., Kim, Tae GeunVolume:
854
Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2020.157261
Date:
February, 2021
File:
PDF, 2.39 MB
2021