Selective Digital Etching of Silicon–Germanium using...

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ACS Applied Materials & Interfaces 2020 / 09

Selective Digital Etching of Silicon–Germanium using Nitric and Hydrofluoric Acids

Li, Chen, Zhu, Huilong, Zhang, Yongkui, Yin, Xiaogen, Jia, Kunpeng, Li, Junjie, Wang, Guilei, Kong, Zhenzhen, Du, Anyan, Yang, Tengzhi, Zhao, Liheng, Huang, Weixing, Xie, Lu, Li, Yangyang, Ai, Xuezhen
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Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.0c14018
Date:
September, 2020
File:
PDF, 1.76 MB
2020
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