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A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
Boysen, Nils, Misimi, Bujamin, Muriqi, Arbresha, Wree, Jan-Lucas, Hasselmann, Tim, Rogalla, Detlef, Haeger, Tobias, Theirich, Detlef, Nolan, Michael, Riedl, Thomas, Devi, AnjanaYear:
2020
Journal:
Chemical Communications
DOI:
10.1039/d0cc05781a
File:
PDF, 1.21 MB
2020