[IEEE 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2020.8.24-2020.8.26)] 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Oval-Shaped OP-Layer Hole Etching: Shape Deformation, Local Arcing, and Hole Bridging Improvements
Yang, Zusing, Chang, Yao-Yuan, Wu, Ming-Tsung, Lee, Hong-Ji, Lian, Nan-Tzu, Yang, Tahone, Chen, Kuang-Chao, Lu, Chih-YuanYear:
2020
DOI:
10.1109/asmc49169.2020.9185191
File:
PDF, 261 KB
2020