Atomic layer deposition of ruthenium using an ABC-type...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2020 / 12 Vol. 38; Iss. 6

Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation

Chopra, Sonali N., Vos, Martijn F. J., Verheijen, Marcel A., Ekerdt, John G., Kessels, Wilhelmus M. M., Mackus, Adriaan J. M.
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Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/6.0000434
Date:
December, 2020
File:
PDF, 3.31 MB
2020
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