Electrical insulation characteristics of...

Materials Science in Semiconductor Processing 2021 / 01 Vol. 121

Electrical insulation characteristics of metal-insulator-metal structures using boron nitride dielectric films deposited with low-energy ion impact

Kamimura, Yuma, Torigoe, Masataka, Teii, Kungen, Matsumoto, Seiichiro
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Volume:
121
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2020.105353
Date:
January, 2021
File:
PDF, 4.30 MB
2021
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