Synergy between dodecylbenzenesulfonic acid and isomeric alcohol polyoxyethylene ether for nano-scale scratch reduction in copper chemical mechanical polishing
Luo, Chong, Xu, Yi, Zeng, Nengyuan, Ma, Tengda, Wang, Chenwei, Liu, YulingVolume:
152
Journal:
Tribology International
DOI:
10.1016/j.triboint.2020.106576
Date:
December, 2020
File:
PDF, 7.93 MB
2020