Analysis of the negative charges injected into a SiO 2 /SiN x stack using plasma charging technology for fieldâeffect passivation on a boronâdoped silicon surface
Min, Kwan Hong, Hwang, JeongâMo, Cho, Eunwan, Song, Heeâeun, Park, Sungeun, Rohatgi, Ajeet, Kim, Donghwan, Lee, HaeâSeok, Kang, Yoonmook, Ok, YoungâWoo, Kang, Min GuJournal:
Progress in Photovoltaics: Research and Applications
DOI:
10.1002/pip.3340
Date:
October, 2020
File:
PDF, 4.85 MB
2020
File converter
More search results
More benefits 
