Hot target magnetron sputtering process: Effect of infrared...

Vacuum 2020 / 11 Vol. 181

Hot target magnetron sputtering process: Effect of infrared radiation on the deposition of titanium and titanium oxide thin films

Graillot-Vuillecot, Robin, Thomann, Anne-Lise, Lecas, Thomas, Cachoncinlle, Christophe, Millon, Eric, Caillard, Amaël
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Volume:
181
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2020.109734
Date:
November, 2020
File:
PDF, 8.75 MB
2020
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