Lithographic Performance of Aryl Epoxy Thermoset Resins as Negative Tone Photoresist for Microlithography
Vlnieska, Vitor, Zakharova, Margarita, Mikhaylov, Andrey, Kunka, DanaysVolume:
12
Journal:
Polymers
DOI:
10.3390/polym12102359
Date:
October, 2020
File:
PDF, 10.95 MB
2020