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Heat transport properties of alumina gate insulator films on Ge substrates fabricated by atomic layer deposition
Uchida, Noriyuki, Nakajima, Yuta, Bolotov, Leonid, Chang, Wen-Hsin, Maeda, Tatsuro, Ohishi, YujiVolume:
121
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2020.105396
Date:
January, 2021
File:
PDF, 167 KB
2021