Reactivity of different nitriding agents with...

Applied Surface Science 2021 / 01 Vol. 535

Reactivity of different nitriding agents with chlorine-terminated surface during atomic layer deposition of silicon nitride

Mayangsari, Tirta Rona, Yusup, Luchana Lamierza, Hidayat, Romel, Chowdhury, Tanzia, Kwon, Young-Kyun, Lee, Won-Jun
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Volume:
535
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.147727
Date:
January, 2021
File:
PDF, 39 KB
2021
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