Density functional theory study on the reducing agents for atomic layer deposition of tungsten using tungsten chloride precursor
Hidayat, Romel, Chowdhury, Tanzia, Kim, Yewon, Kim, Seongyoon, Mayangsari, Tirta Rona, Kim, Soo-Hyun, Lee, Won-JunVolume:
538
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.148156
Date:
February, 2021
File:
PDF, 2.75 MB
2021