An ultra heat-resistant polyimide formulated with...

Reactive and Functional Polymers 2020 / 12 Vol. 157

An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist

Tseng, Ling-Ya, Lin, Yan-Cheng, Kuo, Chih-Cheng, Kuo, Chi-Ching, Ueda, Mitsuru, Chen, Wen-Chang
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Volume:
157
Journal:
Reactive and Functional Polymers
DOI:
10.1016/j.reactfunctpolym.2020.104760
Date:
December, 2020
File:
PDF, 6.74 MB
2020
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