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XAFS and TEM Investigation of Nanocluster Formation in 64Zn+ Ion-Implanted and Thermo-Oxidized SiO2 Film
Khramov, E. V., Privezentsev, V. V., Palagushkin, A. N., Shcherbachev, K. D., Tabachkova, N. Yu.Journal:
Journal of Electronic Materials
DOI:
10.1007/s11664-020-08454-7
Date:
September, 2020
File:
PDF, 1.84 MB
2020