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[IEEE 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2020.8.24-2020.8.26)] 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Spectroscopic Ellipsometry Imaging for Process Deviation Detection via Machine Learning Approach
Alcaire, Thomas, Cunff, Delphine Le, Gredy, Victor, Tortai, Jean-HerveYear:
2020
DOI:
10.1109/asmc49169.2020.9185349
File:
PDF, 850 KB
2020