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[IEEE 2020 International Symposium on VLSI Design, Automation and Test (VLSI-DAT) - Hsinchu, Taiwan (2020.8.10-2020.8.13)] 2020 International Symposium on VLSI Design, Automation and Test (VLSI-DAT) - Excursion Prevention Strategyto Increase Chip Performance by Photomask Tuning
Sharoni, Ofir, Sufrin, Yael, Cohen, Avi, Seltmann, Rolf, Narayana, Aravind, Thamm, ThomasYear:
2020
DOI:
10.1109/vlsi-dat49148.2020.9196276
File:
PDF, 470 KB
2020