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[IEEE 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2020.8.10-2020.8.13)] 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Deposition of High Thermal Conductivity AlN Heat Spreader Films
Ueda, Scott T., McLeod, Aaron, Chen, Michelle, Perez, Chris, Pop, Eric, Alvarez, Dan, Kummel, Andrew C.Year:
2020
DOI:
10.1109/VLSI-TSA48913.2020.9203721
File:
PDF, 253 KB
2020