Aluminum Nitride Nanofilms by Atomic Layer Deposition Using...

Coatings 2020 / 10 Vol. 10; Iss. 10

Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

Dallaev, Rashid, Sobola, Dinara, Tofel, Pavel, Škvarenina, Ľubomir, Sedlák, Petr
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Volume:
10
Journal:
Coatings
DOI:
10.3390/coatings10100954
Date:
October, 2020
File:
PDF, 4.13 MB
2020
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