Effect of heat treatment on electrical and surface...

Materials Science in Semiconductor Processing 2021 / 02 Vol. 122

Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique

Tan, Guang-Lei, Tang, Dan, Dastan, Davoud, Jafari, Azadeh, Silva, José P.B., Yin, Xi-Tao
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Volume:
122
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2020.105506
Date:
February, 2021
File:
PDF, 4.91 MB
2021
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