A two-dimensional model of the chemical vapor deposition of...

A two-dimensional model of the chemical vapor deposition of silicon nitride in a low-pressure hot-wall reactor including multicomponent diffusion

G. Evans, R. Greif
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Volume:
37
Year:
1994
Language:
english
Pages:
9
DOI:
10.1016/0017-9310(94)90155-4
File:
PDF, 960 KB
english, 1994
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