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An ab Initio/RRKM Study of Product Branching Ratios in the Photodissociation of Buta-1,2- and -1,3-dienes and But-2-yne at 193 nm
Hwa-Yu Lee, Vadim V. Kislov, Sheng-Hsien Lin, Alexander M. Mebel, Daniel M. NeumarkVolume:
9
Year:
2003
Language:
english
Pages:
15
DOI:
10.1002/chem.200390081
File:
PDF, 718 KB
english, 2003