Post‐Assembly Photomasking of Potassium...

Helvetica Chimica Acta 2020 / 10

Post‐Assembly Photomasking of Potassium Acyltrifluoroborates (KATs) for Two‐Photon 3D Patterning of PEG‐Hydrogels

Song, Haewon, Wu, Dino, Mazunin, Dimitry, Liu, Sizhou M., Sato, Yoshikatsu, Broguiere, Nicolas, Zenobi‐Wong, Marcy, Bode, Jeffrey W.
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Journal:
Helvetica Chimica Acta
DOI:
10.1002/hlca.202000172
Date:
October, 2020
File:
PDF, 8.97 MB
2020
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