Efficient degradation of 4-fluorophenol under dielectric...

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Chemical Engineering Journal 2020 / 11

Efficient degradation of 4-fluorophenol under dielectric barrier discharge plasma treatment using Cu/Fe-AO-PAN catalyst: Role of H2O2 production

Wang, Xiaojing, Wang, Peng, Wang, Qiao, Xu, Peng, Yang, Chunyan, Xin, Yanjun, Zhang, Guangshan
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Journal:
Chemical Engineering Journal
DOI:
10.1016/j.cej.2020.127577
Date:
November, 2020
File:
PDF, 2.70 MB
2020
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