Semi-Insulating Polysilicon (SIPOS) deposition in a low pressure CVD reactor: II. Oxygen content
Michael L. Hitchman, Alois E. WidmerVolume:
55
Year:
1981
Language:
english
Pages:
9
DOI:
10.1016/0022-0248(81)90107-x
File:
PDF, 690 KB
english, 1981