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The effect of surface preparation on the protective properties of Al2O3 and HfO2 thin films deposited on cp-titanium by atomic layer deposition
SpajiÄ, Ivan, RodiÄ, Peter, Å ekularac, Gavrilo, Lekka, Maria, Fedrizzi, Lorenzo, MiloÅ¡ev, IngridVolume:
366
Journal:
Electrochimica Acta
DOI:
10.1016/j.electacta.2020.137431
Date:
January, 2021
File:
PDF, 271 KB
2021