Area-selective atomic layer deposition enabled by competitive adsorption
Suh, Taewon, Yang, Yan, Sohn, Hae Won, DiStasio, Robert A., Engstrom, James R.Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/6.0000497
Date:
December, 2020
File:
PDF, 4.20 MB
2020