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Effect of the electric-field distribution on the morphology of dot-array gratings fabricated by AFM-based nanolithography
Hu, Kexiang, Long, Fei, Wang, QingkangVolume:
13
Year:
2017
Journal:
International Journal of Nanomanufacturing
DOI:
10.1504/ijnm.2017.082408
File:
PDF, 2.18 MB
2017