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Optimisation of fully depleted SiGe channel with raised source/drain buried oxide nMOSFET
Vanlalawmpuia, K., Bhowmick, Brinda, Choudhury, MadhuchhandaVolume:
11
Year:
2019
Journal:
International Journal of Nanoparticles
DOI:
10.1504/ijnp.2019.099180
File:
PDF, 3.97 MB
2019