Ti–Cu Coatings Deposited by a Combination of HiPIMS and...

Coatings 2020 / 11 Vol. 10; Iss. 11

Ti–Cu Coatings Deposited by a Combination of HiPIMS and DC Magnetron Sputtering: The Role of Vacuum Annealing on Cu Diffusion, Microstructure, and Corrosion Resistance

Qin, Lina, Ma, Donglin, Li, Yantao, Jing, Peipei, Huang, Bin, Jing, Fengjuan, Xie, Dong, Leng, Yongxiang, Akhavan, Behnam, Huang, Nan
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Volume:
10
Journal:
Coatings
DOI:
10.3390/coatings10111064
Date:
November, 2020
File:
PDF, 5.37 MB
2020
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