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Effect of SiO 2 capping layer on the ferroelectricity of Hf 0.5 Zr 0.5 O 2 films
Zhai, Minglong, Sun, Bing, Huang, Kailiang, Chang, Hudong, Liu, HonggangVolume:
10
Journal:
AIP Advances
DOI:
10.1063/5.0027476
Date:
November, 2020
File:
PDF, 9.06 MB
2020