A Secondary Reaction Pathway for the Alumina Atomic Layer...

  • Main
  • 2020 / 11
  • A Secondary Reaction Pathway for the Alumina Atomic Layer...
The Journal of Physical Chemistry C 2020 / 11

A Secondary Reaction Pathway for the Alumina Atomic Layer Deposition Process with Trimethylaluminum and Water, Revealed by Full-Range, Time-Resolved In Situ Mass Spectrometry

Werbrouck, Andreas, Shirazi, Mahdi, Mattelaer, Felix, Elliott, Simon D., Dendooven, Jolien, Detavernier, Christophe
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.0c07602
Date:
November, 2020
File:
PDF, 4.06 MB
2020
Conversion to is in progress
Conversion to is failed