Three-Dimensional Two-Temperature Modeling of Ar Loop-Type...

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Plasma Chemistry and Plasma Processing 2020 / 11

Three-Dimensional Two-Temperature Modeling of Ar Loop-Type Inductively Coupled Thermal Plasma for Surface Modification

Ozeki, Genki, Tanaka, Yasunori, Sugiyama, Y, Nakano, Y, Ishijima, T, Uesugi, Y, Yukimoto, T, Kawaura, H
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Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-020-10144-5
Date:
November, 2020
File:
PDF, 3.41 MB
2020
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