[IEEE 2020 International Symposium on VLSI Technology,...

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[IEEE 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Hsinchu, Taiwan (2020.8.10-2020.8.13)] 2020 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA) - Excursion Prevention Strategy to Increase Chip Performance by Photomask Tuning

Sharoni, Ofir, Sufrin, Yael, Cohen, Avi, Seltmann, Rolf, Narayana, Aravind, Thamm, Thomas
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Year:
2020
DOI:
10.1109/vlsi-tsa48913.2020.9203698
File:
PDF, 130 KB
2020
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