Suppression and characterization of interface states at...

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Applied Surface Science 2020 / 12

Suppression and characterization of interface states at low-pressure-chemical-vapor-deposited SiN /III-nitride heterostructures

Deng, Kexin, Wang, Xinhua, Huang, Sen, Yin, Haibo, Fan, Jie, Shi, Wen, Guo, Fuqiang, Wei, Ke, Zheng, Yingkui, Shi, Jingyuan, Jiang, Haojie, Wang, Wenwu, Liu, Xinyu
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Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.148530
Date:
December, 2020
File:
PDF, 156 KB
2020
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