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Investigation of the impurity distributions in polycrystalline SiSi3N4-SiO2Si layer structures using activation analysis
Agnes Valkó, Henrik RauschVolume:
32
Year:
1976
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(76)90330-8
File:
PDF, 200 KB
english, 1976