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Electrical properties and structure of boron-doped sputter-deposited polycrystalline silicon films
K. Haberle, E. FröschleVolume:
61
Year:
1979
Language:
english
Pages:
9
DOI:
10.1016/0040-6090(79)90506-6
File:
PDF, 1.60 MB
english, 1979