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The structure and electromigration behaviour of aluminium films deposited by the partially ionized beam technique
L.K. Fionova, O.V. Kononenko, V.N. MatveevVolume:
227
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(93)90186-s
File:
PDF, 709 KB
english, 1993