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Investigations of titanium oxide films deposited by d.c. reactive magnetron sputtering in different sputtering pressures
Li-Jian Meng, M.P. dos SantosVolume:
226
Year:
1993
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(93)90200-9
File:
PDF, 696 KB
english, 1993